arXiv preprint ·
Large-Area SnS Crystals by Controlled Sn-S Chemical Vapor Deposition: Growth Optimization, Morphology, and Raman Characterization
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Abstract
Tin monosulfide (SnS) is a layered IV-VI semiconductor with strong in-plane anisotropy and promising properties for optoelectronic and ferroic applications. However, obtaining large, continuous, and morphologically well-defined SnS crystals remains challenging. Here, we report the growth of large-area SnS crystals using chemical vapor deposition with separate elemental Sn and S precursors. By controlling the precursor temperatures, source positions, substrate temperature, carrier-gas flow, and hydrogen flow, we obtain SnS crystals with lateral dimensions approaching 350 micrometers. The optimized growth occurs with the Sn source at approximately 750 degrees C, the S source at approximately 230 degrees C, and the substrate maintained near 650-680 degrees C, using Ar/H2 flow rates of 120/10 sccm. X-ray diffraction shows a dominant SnS (111) reflection with no detectable secondary crystalline tin-sulfide phase within the measurement sensitivity. Raman spectroscopy reveals six characteristic SnS phonon modes at approximately 39.3, 48.8, 95.2, 165.0, 193.1, and 219.1 cm^-1. In particular, the low-frequency modes near 39 and 49 cm^-1 are clearly resolved with FWHM values of approximately 2.52 and 2.37 cm^-1, respectively. SEM and AFM measurements further show large continuous crystals and a relatively smooth nanoscale surface. Growth on mica produces more regular square and rectangular flakes, with lateral dimensions approaching 300 x 300 micrometers, while crystals grown on SiO2/Si are more frequently fractured or irregular at their edges. These results demonstrate a practical growth window for obtaining large-area SnS crystals suitable for further optical, electrical, and device studies.
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